000 | 03285cam a2200265Ii 4500 | ||
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001 | 9781315220833 | ||
008 | 180331s2005 flua obf 001 0 eng d | ||
020 |
_a9781315220833 _q(e-book : PDF) |
||
020 |
_a9781315220833 _q(e-book) |
||
020 |
_a9781351828031 _q(e-book: Mobi) |
||
020 |
_z9780824753740 _q(hardback) |
||
024 | 7 |
_a10.1201/9781420028782 _2doi |
|
035 | _a(OCoLC)62290974 | ||
050 | 4 |
_aTK7872.M3 _bH36 2005 |
|
082 | 0 | 4 |
_a621.381531 _bH236 |
245 | 0 | 0 |
_aHandbook of photomask manufacturing technology / _cedited by Syed Rizvi. |
264 | 1 |
_aBoca Raton [Fla.] : _bTaylor & Francis, _c2005. |
|
300 | _a1 online resource (xxiii, 704 pages) | ||
505 | 0 | 0 |
_tpart section I Introduction -- _tchapter 1 Introduction to Mask Making / _rAndrew G. Zanzal -- _tpart section II Mask Writing -- _tchapter 2 Data Preparation / _rPaul J.M. van Adrichem and Christian K. Kalus -- _tchapter 3 Mask Writers: An Overview / _rSergey Babin -- _tchapter 4 E-Beam Mask Writers / _rNorio Saitou -- _tchapter 5 Laser Mask Writers / _rChrister Rydberg -- _tpart section III Optical Masks -- _tchapter 6 Optical Masks: An Overview / _rNobuyuki Yoshioka -- _tchapter 7 Conventional Optical Masks / _rSyed A. Rizvi -- _tchapter 8 Advanced Optical Masks / _rWilhelm Maurer -- _tpart section IV NGL Masks -- _tchapter 9 NGL Masks: An Overview / _rKurt R. Kimmel -- _tchapter 10 Masks for Electron Beam Projection Lithography / _rHisatak Sano -- _tchapter 11 Masks for Extreme Ultraviolet Lithography / _rPei-yang Yan -- _tchapter 12 Masks for Ion Projection Lithography / _rSyed A. Rizvi -- _tchapter 13 Mask for Proximity X-Ray Lithography / _rMasatoshi Oda -- _tpart section V Mask Processing, Materials, and Pellicles -- _tchapter 14 Mask Substrate / _rSyed A. Rizvi -- _tchapter 15 Resists for Mask Making / _rBenjamen Rathsack -- _tchapter 16 Resist Charging and Heating / _rMin Bai -- _tchapter 17 Mask Processing / _rSyed A. Rizvi -- _tchapter 18 Mask Materials: Optical Properties / _rVladimir Liberman -- _tchapter 19 Pellicles / _rYung-Tsai Yen -- _tpart section VI Mask Metrology, Inspection, Evaluation, and Repairs -- _tchapter 20 Photomask Feature Metrology. James Potzick -- _tchapter 21 Optical Critical Dimension Metrology / _rRay J. Hoobler -- _tchapter 22 Photomask Critical Dimension Metrology in the Scanning Electron Microscope*,** / _rMichael T. Postek -- _tchapter 23 Geometrical Characterization of Masks Using SPM / _rSylvain Muckenhirn -- _tchapter 24 Metrology of Image Placement / _rMichael T. Takac -- _tchapter 25 Optical Thin-Film Metrology for Photomask Applications / _rEbru Apak -- _tchapter 26 Phase Measurement Tool for PSM / _rHal Kusunose -- _tchapter 27 Mask Inspection: Theories and Principles / _rAnja Rosenbusch -- _tchapter 28 Tool for Inspecting Masks: Lasertec MD 2500 / _rMakoto Yonezawa -- _tchapter 29 Tools for Mask Image Evaluation / _rAxel Zibold -- _tchapter 30 Mask Repair / _rRandall Lee -- _tpart section VII Modeling and Simulation -- _tchapter 31 Modeling and Simulation / _rAndreas Erdmann. |
650 | 0 |
_aMasks (Electronics) _vHandbooks, manuals, etc. _917613 |
|
700 | 1 |
_aRizvi, Syed. _917614 |
|
776 | 0 | 8 |
_iPrint version: _z9780824753740 _w(DLC) 2004059306 |
856 | 4 | 0 |
_uhttps://www.taylorfrancis.com/books/9781420028782 _zClick here to view. |
942 | _cEBK | ||
999 |
_c71584 _d71584 |