| 000 | 01534cam a2200313Ii 4500 | ||
|---|---|---|---|
| 001 | 9780429194573 | ||
| 008 | 180331t20162016fluacd ob 001 0 eng d | ||
| 020 |
_a9780429194573 _q(e-book : PDF) |
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| 020 |
_a9781498733878 _q(e-book) |
||
| 020 |
_z9781498711753 _q(hardback) |
||
| 024 | 7 |
_a10.1201/b18745 _2doi |
|
| 035 | _a(OCoLC)915940266 | ||
| 040 |
_aFlBoTFG _cFlBoTFG _erda |
||
| 050 | 4 |
_aQD471 _b.Y36 2016 |
|
| 082 | 0 | 4 |
_a541.224 _bY192 |
| 100 | 1 |
_aYamada, I. _q(Isao), _eauthor. _915850 |
|
| 245 | 1 | 0 |
_aMaterials processing by cluster ion beams : _bhistory, technology, and applications / _cIsao Yamada. |
| 264 | 1 |
_aBoca Raton, Florida : _bCRC Press, _c[2016] |
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| 264 | 4 | _c©2016 | |
| 300 | _a1 online resource | ||
| 336 |
_atext _2rdacontent |
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| 337 |
_acomputer _2rdamedia |
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| 338 |
_aonline resource _2rdacarrier |
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| 505 | 0 | _achapter 1. Ion beam technology : overview and history -- chapter 2. History and milestones of cluster beam development -- chapter 3. Development of cluster beam sources for solid materials -- chapter 4. Gas cluster ion beam equipment -- chapter 5. Cluster ion-solid surface interaction kinetics -- chapter 6. Cluster ion beam sputtering -- chapter 7. Cluster ion implantation -- chapter 8. Cluster ion beam-assisted deposition -- chapter 9. Applications -- chapter 10. Conclusions. | |
| 650 | 0 |
_aComplex ions. _915851 |
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| 776 | 0 | 8 |
_iPrint version: _z9781498711753 _w(DLC) 2015027379 |
| 856 | 4 | 0 |
_uhttps://www.taylorfrancis.com/books/9781498711760 _zClick here to view. |
| 942 | _cEBK | ||
| 999 |
_c71117 _d71117 |
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