000 05134cam a2200469Mi 4500
001 ocn965735579
003 OCoLC
005 20220711203323.0
006 m o d
007 cr |n|||||||||
008 161209s2017 si ob 001 0 eng d
040 _aYDX
_beng
_cYDX
_dDG1
_dN$T
_dIDEBK
_dOCLCF
020 _a9781119107361
_q(electronic bk.)
020 _a1119107369
_q(electronic bk.)
020 _a9781119107378
_q(electronic bk.)
020 _a1119107377
_q(electronic bk.)
020 _z9781119107354 (cloth)
020 _z1119107350 (cloth)
020 _z9781119107385 (epub)
020 _z1119107385 (epub)
035 _a(OCoLC)965735579
050 4 _aTK7871.99.M44
072 7 _aTEC
_x009070
_2bisacsh
082 0 4 _a621.3815/2
_223
049 _aMAIN
100 1 _aOmura, Y.
_q(Yasuhisa),
_eauthor.
_96482
245 1 0 _aMOS devices for low-voltage and low-energy applications
_h[electronic resource] /
_cYasuhisa Omura, Abhijit Mallik, and Naoto Matsuo.
264 1 _aSingapore ;
_aHoboken, NJ :
_bJohn Wiley & Sons,
_c2017.
300 _a1 online resource.
505 0 _aINTRODUCTION TO LOW-VOLTAGE AND LOW-ENERGY DEVICES. Why Are Low-Voltage and Low-Energy Devices Desired? -- History of Low-Voltage and Low-Power Devices -- Performance Prospects of Subthreshold Logic Circuits -- SUMMARY OF PHYSICS OF MODERN SEMICONDUCTOR DEVICES. Overview -- Bulk MOSFET -- SOI MOSFET -- Tunnel Field-Effect Transistors (TFETs) -- POTENTIAL OF CONVENTIONAL BULK MOSFETs. Performance Evaluation of Analog Circuits with Deep Submicrometer MOSFETs in the Subthreshold Regime of Operation -- Impact of Halo Doping on the Subthreshold Performance of Deep-Submicrometer CMOS Devices and Circuits for Ultralow Power Analog/Mixed-Signal Applications -- Study of the Subthreshold Performance and the Effect of Channel Engineering on Deep Submicron Single-Stage CMOS Amplifiers -- Subthreshold Performance of Dual-Material Gate CMOS Devices and Circuits for Ultralow Power Analog/Mixed-Signal Applications -- Performance Prospect of Low-Power Bulk MOSFETs -- POTENTIAL OF FULLY-DEPLETED SOI MOSFETs. Demand for High-Performance SOI Devices -- Demonstration of 100 nm Gate SOI CMOS with a Thin Buried Oxide Layer and its Impact on Device Technology -- Discussion on Design Feasibility and Prospect of High-Performance Sub-50 nm Channel Single-Gate SOI MOSFET Based on the ITRS Roadmap -- Performance Prospects of Fully Depleted SOI MOSFET-Based Diodes Applied to Schenkel Circuits for RF-ID Chips -- The Potential and the Drawbacks of Underlap Single-Gate Ultrathin SOI MOSFET -- Practical Source/Drain Diffusion and Body Doping Layouts for High-Performance and Low-Energy Triple-Gate SOI MOSFETs -- Gate Field Engineering and Source/Drain Diffusion Engineering for High-Performance Si Wire Gate-All-Around MOSFET and Low-Power Strategy in a Sub-30 nm-Channel Regime -- Impact of Local High-k Insulator on Drivability and Standby Power of Gate-All-Around SOI MOSFET -- POTENTIAL OF PARTIALLY DEPLETED SOI MOSFETs. Proposal for Cross-Current Tetrode (XCT) SOI MOSFETs -- Device Model of the XCT-SOI MOSFET and Scaling Scheme -- Low-Power Multivoltage Reference Circuit Using XCT-SOI MOSFET -- Low-Energy Operation Mechanisms for XCT-SOI CMOS Devices -- QUANTUM EFFECTS AND APPLICATIONS - 1. Overview -- Si Resonant Tunneling MOS Transistor -- Tunneling Dielectric Thin-Film Transistor -- Proposal for a Tunnel-Barrier Junction (TBJ) MOSFET -- Performance Prediction of SOI Tunneling-Barrier-Junction MOSFET -- Physics-Based Model for TBJ-MOSFETs and High-Frequency Performance Prospects -- Low-Power High-Temperature-Operation-Tolerant (HTOT) SOI MOSFET -- QUANTUM EFFECTS AND APPLICATIONS - 2. Overview of Tunnel Field-Effect Transistor -- Impact of a Spacer Dielectric and a Gate Overlap/Underlap on the Device Performance of a Tunnel Field-Effect Transistor -- The Impact of a Fringing Field on the Device Performance of a P-Channel Tunnel Field-Effect Transistor with a High-k Gate Dielectric -- Impact of a Spacer-Drain Overlap on the Characteristics of a Silicon Tunnel Field-Effect Transistor Based on Vertical Tunneling -- Gate-on-Germanium Source Tunnel Field-Effect Transistor Enabling Sub-0.5-V Operation -- PROSPECTS OF LOW-ENERGY DEVICE TECHNOLOLGY AND APPLICATIONS. Performance Comparison of Modern Devices -- Emerging Device Technology and the Future of MOSFET -- How Devices Are and Should Be Applied to Circuits -- Prospects for Low-Energy Device Technology and Applications.
504 _aIncldues bibliographical references and index.
650 0 _aMetal oxide semiconductors.
_96483
650 7 _aTECHNOLOGY & ENGINEERING / Mechanical
_2bisacsh
_96484
650 7 _aMetal oxide semiconductors.
_2fast
_0(OCoLC)fst01017624
_96483
655 4 _aElectronic books.
_93294
700 1 _aMallik, Abhijit,
_eauthor.
_96485
700 1 _aMatsuo, N.
_q(Naoto),
_eauthor.
_96486
776 0 8 _iPrint version:
_z9781119107354
_z1119107350
_z9781119107385
_z1119107385
_w(DLC) 2016026240
_w(OCoLC)951506454
856 4 0 _uhttps://doi.org/10.1002/9781119107361
_zWiley Online Library
942 _cEBK
994 _a92
_bDG1
999 _c68678
_d68678