THIN FILM MATERIALS:STRESS,DEFECT FORMATION &SURFACE EVOLUTION
By: FREUND, L.B.
Material type:
BookPublisher: Cambridge Cambridge University Press 2003Description: xviii+750p,.24x17Cms.ISBN: 0521529778.DDC classification: 621.38152 F891
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CENTRAL LIBRARY | 621.38152 F891 (Browse shelf) | Available | 088674 |
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| 621.38152 D97S Semiconductor Devices and Circuits | 621.38152 E49 THIN FILM TECHNOLOGY HANDBOOK | 621.38152 F723 POROUS SILICON CARBIDE AND GALLIUM NITRIDE | 621.38152 F891 THIN FILM MATERIALS:STRESS,DEFECT FORMATION &SURFACE EVOLUTION | 621.38152 G532 MODERN SEMICONDUCTOR FABRICATION TECHNOLOGY | 621.38152 G736 METAL IMPURITIES IN SILICON-DEVICE FABRICATION | 621.38152 G866 SEMI CONDUCTOR DEVICES MEASUREMENTS AND TESTS |
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